Career opportunities within science and technology are seeing unprecedented growth across the world, and those who study chemistry or another natural science at university now have increasingly better career prospects. 4330-21-6, Name is Hoffer’s chlorosugar, SMILES is O=C(O[C@@H]1[C@@H](COC(C2=CC=C(C)C=C2)=O)O[C@H](Cl)C1)C3=CC=C(C)C=C3, belongs to dioxole compound. In a article, author is Garza, CM, introduce new discover of the category.
A great deal of resources has been invested by the semiconductor industry as a whole to make ready 157 nm as the next lithography technology node. Despite of all this effort serious infrastructure issues remain to be solved. Perhaps the first one is the availability of CaF2, but a close second is a suitable soft-pellicle material. It has been previously reported(1-4) that standard 193 nm materials, like Teflon AF(R) and Cytop(R), fail catastrophically upon exposure at 157 nm radiation; and that their transmission is very poor to non-existent. In this paper we report data showing that these materials have higher transmission and lifetimes than previously thought 2. The physical lifetime of Cytop(R) of nearly 500 J/cm(2) is remarkably high, although the transmission varies as a function dose suggesting physical and chemical changes from the onset. For Teflon AF(R) the transmission is a more complex function of exposure dose, suggesting competing mechanisms. From experiments run with PVDF (polyvinyl difluoride), we conclude that the widely reported photodarkening effect is due to the presence of hydrogen in close proximity to a fluorine atom. From IR spectra we conclude that the dioxole moeity in Teflon AF(R) undergoes a series of photochemical reactions that lead to the physical destruction of the polymer.
Synthetic Route of 4330-21-6, This is the end of this tutorial post, and I hope it has helped your research about 4330-21-6.
Reference:
1,3-Benzodioxole – Wikipedia,
,Dioxole | C3H4O2 – PubChem